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Title: Energy-loss distributions for 2. 5-MeV He[sup +] ions incident on Si single crystals

Journal Article · · Physical Review A; (United States)
; ;  [1]
  1. Department of Physics, University of Florida, P.O. Box 118440, Gainesville, Florida 32611-8440 (United States)

The energy distributions for 2.5-MeV He[sup +] ions incident on thin Si single crystals are studied. Detailed angular scans are taken through the [l angle]110[r angle] and [l angle]100[r angle] axial directions along the [l brace]111[r brace] and [l brace]110[r brace] planar directions as well as perpendicular to the planar directions for Si(110) (0.74- and 1.4-[mu]m-thick) and Si(100) (0.75-[mu]m-thick) samples, respectively. Complex structures in the distributions are observed throughout the angular scans. The experimental distributions are reasonably well reproduced by a Monte Carlo simulation using the semiclassical approximation [N. M. Kabachnik, V. N. Kondratev, and O. V. Chumanova, Phys. Status Solidi B 145, 103 (1988)] for energy loss to core electrons and the two-component free-electron-gas model for energy loss to valence electrons. Systematic deviations between theory and experiment are observed and discussed in terms of an increased penetration depth necessary for He[sup +] ions to become fully ionized when channeled.

OSTI ID:
6401573
Journal Information:
Physical Review A; (United States), Vol. 51:3; ISSN 1050-2947
Country of Publication:
United States
Language:
English