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Title: Helium-3 in nickel-base amorphous metals: Surface features, subsurface microstructure, migration, and release upon annealing

Miscellaneous ·
OSTI ID:6281452

The amorphous alloys Ni{sub 75.1}Cr{sub 14}P{sub 10.1}C{sub 0.08}, Ni{sub 63.5}Zr{sub 36.5}, and Ni{sub 87.7}P{sub 12.3} have been implanted with 150 keV helium-3 ions with doses 1 {times} 10{sup 16} He{sup 3}/cm{sup 2} and 5 {times} 10{sup 16} He{sup 3}/cm{sup 2}. The samples were isochronally annealed at several consecutive stages up t their crystallization temperatures. The surface features were examined by scanning electron microscope, subsurface microstructural changes were investigated by electron diffraction using a scanning transmission electron microscope, and helium-3 depth profiles were measured by a thermal neutron induced nuclear reaction technique called neutron depth profiling (NDP). It was confirmed that for amorphous metals: (a) the helium-3 release is concentration dependent; (b) the migration and the release of helium-3 is controlled by detrapping mechanism; and (c) the crystallization temperatures obtained in this study are in agreement with the reported values. The penetration depth or the projected depth of helium-3 ions with an initial energy of 150 keV is measured here for the first time after obtaining the depth profiles by using the NDP technique. The most probable range values are: 320 nm for Ni{sub 75.1}Cr{sub 14}P{sub 10.1}C{sub 0.08}, 378 nm for Ni{sub 63.5}Zr{sub 36.5} and 375 nm for Ni{sub 87.7}P{sub 12.3}. No blisters, bubbles or pitting were observed on the samples when they were annealed up to their crystallization temperature. Some of the helium-3 trapped in amorphous metals seems not to be as strongly bound as in single crystal nickel. More helium-3 release was observed for the metal-metal amorphous metal samples than the metal-metalloid amorphous metal. For metal-metal amorphous alloy the helium-3 release behavior can be correlated with the partial or full crystallization. For metal-metalloid amorphous alloys this correlation may depend on the chemical composition.

Research Organization:
Michigan Univ., Ann Arbor, MI (USA)
OSTI ID:
6281452
Resource Relation:
Other Information: Thesis (Ph. D.)
Country of Publication:
United States
Language:
English

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