Preparation and structure of rare earth transition metal alloy thin films

Journal Article · Fri Jan 01 00:00:00 EST 1993 · Materials Research Bulletin; (United States)

DOI:https://doi.org/10.1016/0025-5408(93)90009-3· OSTI ID:6154331

Qui, J F; Taylor, K N.R.; Russell, G J ^[1]

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1. Univ. of New South Wales, Kensington (Australia). Advanced Electronic Materials Physics

Quaternary GdTbFeCo alloy thin films with various thicknesses from 30 to 700nm have been rf-magnetron sputtered onto glass substrates, single crystal silicon wafers for SEM observations and carbon-coated 3mm diameter copper grids for TEM from the composite target made of an Fe[sub 80]Co[sub 20] powder alloy compact disk and Gd,Tb chips placed on the surface. The amorphous GdTbFeCo alloy thin films deposited by the present process are very uniform in thickness and composition. SEM and TEM observations show that the GdTbFeCo thin films are very smooth, dense and morphologically featureless. These results suggest that the sputter processing methods in the laboratory can be used to fabricate high quality rare earth-transition metal alloy thin films.

• OSTI ID: 6154331
• Journal Information: Materials Research Bulletin; (United States), Vol. 28:1; ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COBALT ALLOYS
CRYSTAL STRUCTURE
FABRICATION
GADOLINIUM ALLOYS
IRON ALLOYS
TERBIUM ALLOYS
ALLOY SYSTEMS
AMORPHOUS STATE
SPUTTERING
SUBSTRATES
THIN FILMS
ALLOYS
FILMS
RARE EARTH ALLOYS
360101* - Metals & Alloys- Preparation & Fabrication
360102 - Metals & Alloys- Structure & Phase Studies