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Title: Crystallization of ultrathin W-Si multilayer structures by high-energy heavy ion irradiations

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104052· OSTI ID:6085767
;  [1];  [2];  [3]; ;  [4]
  1. URA CNRS 783, Faculte des Sciences de Luminy, Departement de Physique, Case 901-13 288 Marseille Cedex 9 (France)
  2. URA CNRS 843, Faculte des Sciences de St. Jerome, Case 141-13397 Marseille Cedex 13 (France)
  3. CIRIL, Rue Claude Bloch, BP 5133-14040 Caen Cedex (France)
  4. CRN Groupe Phase-67037 Strasbourg Cedex (France)

Ultrathin amorphous multilayers structures (1.55 nm bilayer period) were irradiated by high-energy heavy ion ({sup 127}I and {sup 238}U ions). Transmission electron microscopy study shows that the ion-material interaction in such a configuration leads to an irreversible transformation of the initial amorphous structures. In this letter, we report the first observation of the crystallization of the multilayers induced by the heavy ion irradiations with a subsequent formation of a new WSi structure. The crucial role of the electronic effects in the crystallization process is discussed relatively to the other phenomena induced under the ion irradiation.

OSTI ID:
6085767
Journal Information:
Applied Physics Letters; (USA), Vol. 57:17; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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