Effect of molecular oxygen on the UV-polymerization of methyl methacrylate initiated by 2,2-dimethoxy-2-phenylaceto-phenone and 1-hydroxycyclohexyl phenyl ketone in solution

Journal Article · Wed Jan 01 00:00:00 EST 1986 · J. Radiat. Curing; (United States)

OSTI ID:5849008

Phan, X T

The photopolymerization of methyl methacrylate (MMA) in a dilute benzene solution containing 2,2-dimethoxy-2-phenylacetophenone (DMPA) or 1-hydroxycyclohexyl phenyl ketone (HCPK) was investigated. Product analyses indicate that under a nitrogen atmosphere in the presence of MMA both radicals from HCPK are involved in polymerization of MMA whereas only 30% of the benzoyl radicals and 15% of the 1,1-dimethoxybenzyl radicals from DMPA are involved in radical polymerization. Under an oxygen atmosphere, products are formed in increased amounts, resulting in fewer radicals available for polymerization. The polymerization is inhibited by oxygen, as shown by a five-fold decrease in polymerization quantum efficiency, and lower yields of poly(methyl methacrylate). The addition of amines is not effective in relieving this effect.

• Research Organization: Armstrong World Industries, Inc., Lancaster, PA
• OSTI ID: 5849008
• Journal Information: J. Radiat. Curing; (United States), Vol. 13:1
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
METHYL METHACRYLATE
PHOTOCHEMICAL REACTIONS
POLYMERIZATION
ACETOPHENONE
ADDITIVES
AMINES
BENZENE
BENZOYL RADICALS
CHEMICAL REACTION KINETICS
CHEMICAL REACTION YIELD
INHIBITION
NITROGEN
OXYGEN
ULTRAVIOLET RADIATION
AROMATICS
CARBOXYLIC ACID ESTERS
CHEMICAL REACTIONS
ELECTROMAGNETIC RADIATION
ELEMENTS
ESTERS
HYDROCARBONS
KETONES
KINETICS
METHACRYLIC ACID ESTERS
NONMETALS
ORGANIC COMPOUNDS
RADIATIONS
RADICALS
REACTION KINETICS
YIELDS
400500* - Photochemistry