Influence of process parameter variation on the reflectivity of sputter-deposited W--C multilayer diffraction gratings

Journal Article · Thu May 01 00:00:00 EDT 1986 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.573862· OSTI ID:5728901

Sager, B; Benson, P; Jahoda, K; Jacobs, J R; Bloch, J J; Sanders, W T; Lagally, M G

Multilayer W--C diffraction gratings with nominal d spacings of 35 A have been fabricated by magnetron sputter deposition. The peak and integrated reflectivities of these films have been measured with AlK/sub ..cap alpha../ x rays and compared to theoretical values. The rms surface roughness has been evaluated. The influence of several sputtering-system process parameters on the reflectivities has been investigated.

• Research Organization: University of Wisconsin, Madison, Wisconsin 53706
• OSTI ID: 5728901
• Journal Information: J. Vac. Sci. Technol., A; (United States), Vol. 4:3
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON
REFLECTIVITY
ROUGHNESS
GRATINGS
FABRICATION
TUNGSTEN
X-RAY SPECTROSCOPY
MAGNETRONS
SPUTTERING
THIN FILMS
X RADIATION
ELECTROMAGNETIC RADIATION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
IONIZING RADIATIONS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NONMETALS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SPECTROSCOPY
SURFACE PROPERTIES
TRANSITION ELEMENTS
360104* - Metals & Alloys- Physical Properties
360101 - Metals & Alloys- Preparation & Fabrication