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Title: Journal of Research of the National Institute of Standards and Technology, July-August 1993. Volume 98, Number 4

Technical Report ·
OSTI ID:5687762

Contents: X-Ray Lithography Mask Metrology--Use of Transmitted Electrons in an SEM for Linewidth Measurement; Interlaboratory Study on the Lithographically Produced Scanning Electron Microscope Magnification Standard Prototype; Phase Equilibria and Crystal Chemistry in Portions of the System SrO-CaO-Bi2O3-CuO, Part IV--The System CaO-Bi2O3-CuO.

Research Organization:
National Bureau of Standards, Gaithersburg, MD (United States)
OSTI ID:
5687762
Report Number(s):
PB-94-108529/XAB
Resource Relation:
Other Information: See also PB--94-108537 through PB--94-108552 and PB--94-108461. Also available from Supt. of Docs. as SN703-027-00053-9
Country of Publication:
United States
Language:
English