Improved performance of XeF lasers in argon diluent
A comparison of laser performance in electron beam pumped XeF using either neon or argon diluent is presented. Extraction measurements are performed at room temperature under high-energy loading conditions (160 kW/cm/sup 3/, 1 ..mu..s laser pulse lengths) using either NF/sub 3/ or F/sub 2/ as halogen fuels. It is found with neon diluent that the laser output remains relatively constant during the excitation pulse, but with argon diluent the output increases almost linearly during the pulse. This continuous rise of the laser output with argon diluent leads to efficiencies higher than with neon diluent for input energy loadings approx. >100 J/l. There are also indications that the argon diluent mixture is less susceptible to halogen burn-up.
- Research Organization:
- Spectra Technology, Inc., 2755 Northup Way, Bellevue, Washington 98004
- OSTI ID:
- 5137593
- Journal Information:
- Appl. Phys. Lett.; (United States), Vol. 49:20
- Country of Publication:
- United States
- Language:
- English
Similar Records
Narrowband gain saturation characteristics in XeF lasers
Xenon excited-state densities in electron-beam pumped XeCl and XeF
Related Subjects
EXCIMER LASERS
PERFORMANCE
ARGON
ELECTRON BEAM PUMPING
GASES
LOADING
NEON
NITROGEN FLUORIDES
XENON FLUORIDES
ELECTRICAL PUMPING
ELEMENTS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
LASERS
MATERIALS HANDLING
NITROGEN COMPOUNDS
NONMETALS
PUMPING
RARE GAS COMPOUNDS
RARE GASES
XENON COMPOUNDS
420300* - Engineering- Lasers- (-1989)