Step-induced magnetic anisotropy in Co/stepped Cu(001) as a function of step density and Cu step decoration

Journal Article · Thu Apr 01 00:00:00 EST 1999 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.370057· OSTI ID:336626

Kawakami, R K; Bowen, M O; Choi, H J; Escorcia-Aparicio, E J; Qiu, Z Q ^[1]

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1. Department of Physics, University of California at Berkeley, Berkeley, California 94720 (United States)

The step-induced in-plane uniaxial magnetic anisotropy of fcc Co/stepped Cu(001) was investigated using a curved substrate to provide a continuous range of vicinal angles from 0{degree} to 6{degree}. The anisotropy strength was found to depend linearly on the step density, indicating that the biaxial strain does not make a significant contribution to the step-induced anisotropy. Using a side growth geometry to decorate the Co step edges with Cu adsorbates, we observed that the step-induced anisotropy strength approaches zero at roughly 0.7 atomic rows of Cu, independent of step density. {copyright} {ital 1999 American Institute of Physics.}

• OSTI ID: 336626
• Journal Information: Journal of Applied Physics, Vol. 85, Issue 8; Other Information: PBD: Apr 1999
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COBALT
ANISOTROPY
THIN FILMS
MAGNETIC PROPERTIES
KERR EFFECT
MAGNETO-OPTICAL EFFECTS
COPPER
SURFACE PROPERTIES