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Title: Soft chemical synthesis of silicon nanosheets and their applications

Journal Article · · Applied Physics Reviews
DOI:https://doi.org/10.1063/1.4952442· OSTI ID:22594496
;  [1]
  1. Toyota Central R&D Labs., Inc., 41-1 Yokomichi, Nagakute, Aichi 480-1192 (Japan)

Two-dimensional silicon nanomaterials are expected to show different properties from those of bulk silicon materials by virtue of surface functionalization and quantum size effects. Since facile fabrication processes of large area silicon nanosheets (SiNSs) are required for practical applications, a development of soft chemical synthesis route without using conventional vacuum processes is a challenging issue. We have recently succeeded to prepare SiNSs with sub-nanometer thicknesses by exfoliating layered silicon compounds, and they are found to be composed of crystalline single-atom-thick silicon layers. In this review, we present the synthesis and modification methods of SiNSs. These SiNSs have atomically flat and smooth surfaces due to dense coverage of organic moieties, and they are easily self-assembled in a concentrated state to form a regularly stacked structure. We have also characterized the electron transport properties and the electronic structures of SiNSs. Finally, the potential applications of these SiNSs and organic modified SiNSs are also reviewed.

OSTI ID:
22594496
Journal Information:
Applied Physics Reviews, Vol. 3, Issue 4; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 1931-9401
Country of Publication:
United States
Language:
English