Atmospheric pressure plasma polymerization using double grounded electrodes with He/Ar mixture
- School of Electronics Engineering, College of IT Engineering, Kyungpook National University, Daegu, 702-701 (Korea, Republic of)
- Department of Electronics Engineering, Sejong University, Seoul 143-747 (Korea, Republic of)
- Department of Electronics Engineering, Incheon National University, Incheon 406-772 (Korea, Republic of)
In this study, we have proposed the double grounded atmospheric pressure plasma jet (2G-APPJ) device to individually control the plasmas in both fragmentation (or active) and recombination (or passive) regions with a mixture of He and Ar gases to deposit organic thin films on glass or Si substrates. Plasma polymerization of acetone has been successfully deposited using a highly energetic and high-density 2G-APPJ and confirmed by scanning electron microscopy (SEM). Plasma composition was measured by optical emission spectroscopy (OES). In addition to a large number of Ar and He spectra lines, we observed some spectra of C{sub 2} and CH species for fragmentation and N{sub 2} (second positive band) species for recombination. The experimental results confirm that the Ar gas is identified as a key factor for facilitating fragmentation of acetone, whereas the He gas helps the plume of plasma reach the substrate on the 2{sup nd} grounded electrode during the plasma polymerization process. The high quality plasma polymerized thin films and nanoparticles can be obtained by the proposed 2G-APPJ device using dual gases.
- OSTI ID:
- 22492352
- Journal Information:
- AIP Advances, Vol. 5, Issue 9; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
- Country of Publication:
- United States
- Language:
- English
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