Highly efficient and controllable method to fabricate ultrafine metallic nanostructures
- Hefei National Laboratory for Physical Sciences at the Microscale, University of Science & Technology of China, Hefei 230026 (China)
- Physics school, Anhui University, Hefei Anhui 230601 China (China)
- National Synchrotron Radiation Laboratory, University of Science & Technology of China, Hefei 230027 (China)
We report a highly efficient, controllable and scalable method to fabricate various ultrafine metallic nanostructures in this paper. The method starts with the negative poly-methyl-methacrylate (PMMA) resist pattern with line-width superior to 20 nm, which is obtained from overexposing of the conventionally positive PMMA under a low energy electron beam. The pattern is further shrunk to sub-10 nm line-width through reactive ion etching. Using the patter as a mask, we can fabricate various ultrafine metallic nanostructures with the line-width even less than 10 nm. This ion tailored mask lithography (ITML) method enriches the top-down fabrication strategy and provides potential opportunity for studying quantum effects in a variety of materials.
- OSTI ID:
- 22492198
- Journal Information:
- AIP Advances, Vol. 5, Issue 11; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
- Country of Publication:
- United States
- Language:
- English
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