Influence of substrate temperature on structural and optical properties of RF sputtered ZnMnO thin films

Journal Article · Mon Jun 15 00:00:00 EDT 2015 · Semiconductors

DOI:https://doi.org/10.1134/S1063782615060184· OSTI ID:22469898

Pashaei, Parisa; Akin, Nihan; Ceren Baskose, U.; Kemal Ozturk, M.; Cakmak, Mehmet; Ozcelik, Suleyman ^[1]

---

1. Gazi University, Photonics Application and Research Center (Turkey)

The ZnMnO thin films were deposited on glass substrates by radio frequency magnetron sputtering method. The properties of ZnMnO thin films were investigated by high-resolution x-ray diffractometer (HRXRD),atomic force microscopy (AFM), UV-Vis spectrometer and room temperature photoluminescence (PL), under the influence of substrate temperature. The substrate temperature was varied from 300, 400 and 500°C. With increasing the substrate temperature, the structure of the films changed from cubic to hexagonal. The cubic ZnMnO thin films grown along [210] direction, while the hexagonal ones grown along [002] direction. The changes in surface morphology provided a proof on the structural transition. Also, decrease and increase of optical band gap is associated with cubic or hexagonal structure of the films.

• OSTI ID: 22469898
• Journal Information: Semiconductors, Vol. 49, Issue 6; Other Information: Copyright (c) 2015 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
CUBIC LATTICES
GLASS
HEXAGONAL LATTICES
MANGANESE OXIDES
MORPHOLOGY
OPTICAL PROPERTIES
PHOTOLUMINESCENCE
RADIOWAVE RADIATION
RESOLUTION
SPUTTERING
SUBSTRATES
SURFACES
TEMPERATURE DEPENDENCE
THIN FILMS
X-RAY DIFFRACTION
ZINC COMPOUNDS