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Title: Tailoring the crystal structure of TiO{sub 2} thin films from the anatase to rutile phase

TiO{sub 2} films with various Sn concentrations were deposited on quartz substrates using rf reactive magnetron sputtering. The crystal structure was investigated by using x-ray diffraction, Raman spectroscopy, and transmission electron microscopy, and the chemical states of Ti and Sn were analyzed by x-ray absorption near edge structure (XANES) spectroscopy. Without Sn doping, TiO{sub 2} films change the crystal structure from rutile to anatase as the total gas pressure increases in the sputtering deposition. On the other hand, Sn doping induces the transformation of TiO{sub 2} crystalline structure from anatase to rutile phase, where the XANES spectra implied that Sn substitutes into Ti site of rutile TiO{sub 2}. Atomic force microscope analyses revealed that the Sn-doped TiO{sub 2} films exhibited a flat surface with the roughness of approximately 2 nm.
Authors:
; ; ;  [1] ;  [2]
  1. Graduate School of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Chuo, Sagamihara 252-5258 (Japan)
  2. Kyushu Synchrotron Light Research Center, 8-7 Yayoigaoka, Tosu, Saga 841-0005 (Japan)
Publication Date:
OSTI Identifier:
22392199
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 4; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ABSORPTION; ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; DOPED MATERIALS; MAGNETRONS; QUARTZ; RAMAN SPECTROSCOPY; ROUGHNESS; RUTILE; SPUTTERING; THIN FILMS; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RADIATION; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY