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Title: Undoped TiO{sub 2} and nitrogen-doped TiO{sub 2} thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications

Undoped and nitrogen doped TiO{sub 2} thin films were deposited by atomic layer deposition on planar substrates. Deposition on 3D-architecture substrates made of metallic foams was also investigated to propose architectured photovoltaic stack fabrication. All the films were deposited at 265 °C and nitrogen incorporation was achieved by using titanium isopropoxide, NH{sub 3} and/or N{sub 2}O as precursors. The maximum nitrogen incorporation level obtained in this study was 2.9 at. %, resulting in films exhibiting a resistivity of 115 Ω cm (+/−10 Ω cm) combined with an average total transmittance of 60% in the 400–1000 nm wavelength range. Eventually, TiO{sub 2} thin films were deposited on the 3D metallic foam template.
Authors:
; ; ; ; ; ; ; ; ; ;  [1] ; ;  [2]
  1. SIMaP Laboratory - CNRS, Univ. Grenoble Alpes, F-38000 Grenoble (France)
  2. LMGP Laboratory - CNRS, Univ. Grenoble Alpes, F-38000 Grenoble (France)
Publication Date:
OSTI Identifier:
22392114
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; AMMONIA; DEPOSITION; DEPOSITS; DOPED MATERIALS; FABRICATION; FOAMS; NITROGEN; NITROUS OXIDE; PHOTOVOLTAIC EFFECT; SUBSTRATES; SURFACES; THIN FILMS; TITANIUM OXIDES; WAVELENGTHS