Optical and transport properties of LaTi{sub 1−x}M{sub x}(O,N){sub 3±δ} (x=0; 0.1, M=Nb{sup 5+}, W{sup 6+}) thin films prepared by plasma ammonolysis

Journal Article · Sat Mar 15 00:00:00 EDT 2014 · Journal of Solid State Chemistry

DOI:https://doi.org/10.1016/J.JSSC.2013.12.008· OSTI ID:22275853

Maegli, Alexandra E.; Sagarna, Leyre; Populoh, Sascha; Penkala, Bartosz; Otal, Eugenio H.; Weidenkaff, Anke

Oxynitride thin films of composition LaTi{sub 1−x}M{sub x}(O,N){sub 3±δ} with x=0; 0.1 and M=Nb{sup 5+}, W{sup 6+} were prepared by nitridation via microwave-induced plasma (MIP) ammonolysis, which allowed keeping the nitridation time short (16 min). The higher possible oxidation states of the B-site substituents (Nb{sup 5+}, W{sup 6+}) with respect to Ti{sup 4+} caused higher N content for LaTi{sub 0.9}Nb{sub 0.1}(O,N){sub 3±δ} and LaTi{sub 0.9}W{sub 0.1}(O,N){sub 3±δ} compared to LaTiO{sub 2}N due to charge-compensation. XPS O 1s and N 1s core level and valence band spectra evidenced for increasing N content in the order LaTiO{sub 2}N

• OSTI ID: 22275853
• Journal Information: Journal of Solid State Chemistry, Vol. 211, Issue Complete; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0022-4596
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
36 MATERIALS SCIENCE
AMMONOLYSIS
CHARGE CARRIERS
DENSITY
ELECTRIC CONDUCTIVITY
NIOBIUM IONS
NITRIDATION
PLASMA
SPECTRA
SYNTHESIS
THIN FILMS
TITANIUM IONS
TUNGSTEN IONS
X-RAY PHOTOELECTRON SPECTROSCOPY