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Title: Hybrid model of atmospheric pressure Ar/O{sub 2}/TiCl{sub 4} radio-frequency capacitive discharge for TiO{sub 2} deposition

A hybrid global-analytical model of an atmospheric pressure radio-frequency driven capacitive discharge is applied to determine the plasma conditions for TiO{sub 2} film deposition. The feed gas is mainly argon with a small fraction of O{sub 2} and a smaller fraction of TiCl{sub 4}. Variations of the discharge parameters and species densities with O{sub 2} concentration, discharge power, and flow rate are determined. A simplified chemistry model is developed and compared with the simulation results, showing good agreement. For a base case with Ar/O{sub 2}/TiCl{sub 4} flow rates of 203/30/0.17 sccm, the results indicate that a minimum O{sub 2} fraction of 7.3 × 10{sup −4} is required for pure (un-chlorinated) TiO{sub 2} film deposition that the active precursor species is TiO{sub 2}Cl{sub 3}, with subsequent abstraction of Cl atoms by dissociative electron attachment and that the deposition rates are around 1 nm/s.
Authors:
 [1] ;  [2] ;  [3] ; ; ;  [4]
  1. ENS Cachan, UPMC, Paris (France)
  2. College of Science, Donghua University, Shanghai 201620 (China)
  3. Department of Electrical Engineering, University of California, Berkeley, California 94720 (United States)
  4. College of Materials Science and Engineering, Donghua University, Shanghai 201620 (China)
Publication Date:
OSTI Identifier:
22275561
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 18; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ARGON; ATMOSPHERIC PRESSURE; COMPARATIVE EVALUATIONS; COMPUTERIZED SIMULATION; CONCENTRATION RATIO; DEPOSITION; ELECTRON ATTACHMENT; FLOW RATE; RADIOWAVE RADIATION; THIN FILMS; TITANIUM CHLORIDES; TITANIUM OXIDES