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Title: Effect of discharge current and deposition temperature on roughness and density of NbC films fabricated by ion beam sputtering technique

NbC films were prepared using Ion beam sputtering system at various discharges current from 0.4 amps to 1.2 amps at room temperature. Effect of temperature on NbC films were also studied by depositing NbC films at various temperatures from room temperature to 200,300,400 and 600°C. X-ray reflectivity (XRR) study shows that surface roughness of the film decreases with decrease in discharge current. The optimum lowest roughness 3.2Å having density 92% of bulk was achieved at discharge current 0.6 amps at 3.0 cm{sup 3}/min Ar gas flow. X-ray study also shows that film roughness decreases with increase in temperature of the film and after a certain temperature it increases with increase in temperature. The lowest surface roughness 2.1Å was achieved at 300°C with density 83% of bulk NbC at constant discharge current 0.6 amps.
Authors:
; ;  [1]
  1. X-ray optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Center for Advanced Technology, Indore-452013 (India)
Publication Date:
OSTI Identifier:
22271071
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; DEPOSITION; ELECTRIC CURRENTS; GAS FLOW; ION BEAMS; NIOBIUM CARBIDES; REFLECTIVITY; ROUGHNESS; SPUTTERING; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION