Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges
- School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
The electron density is measured in low-pressure dual-frequency (2/60 MHz) capacitively coupled oxygen discharges by utilizing a floating hairpin probe. The dependence of electron density at the discharge center on the high frequency (HF) power, low frequency (LF) power, and gas pressure are investigated in detail. A (1D) particle-in-cell/Monte Carlo method is developed to calculate the time-averaged electron density at the discharge center and the simulation results are compared with the experimental ones, and general agreements are achieved. With increasing HF power, the electron density linearly increases. The electron density exhibits different changes with the LF power at different HF powers. At low HF powers (e.g., 30 W in our experiment), the electron density increases with increasing LF power while the electron density decreases with increasing LF power at relatively high HF powers (e.g., 120 W in our experiment). With increasing gas pressure the electron density first increases rapidly to reach a maximum value and then decreases slowly due to the combined effect of the production process by the ionization and the loss processes including the surface and volume losses.
- OSTI ID:
- 22224106
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 31, Issue 6; Other Information: (c) 2013 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
Similar Records
Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma
Experimental investigations of driving frequency effect in low-pressure capacitively coupled oxygen discharges