Effect of electron energy distribution functions on plasma generated vacuum ultraviolet in a diffusion plasma excited by a microwave surface wave

Journal Article · Mon Jul 15 00:00:00 EDT 2013 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4813818· OSTI ID:22122817

Zhao, J. P.; Chen, L.; Funk, M.; Sundararajan, R. ^[1]; Nozawa, T. ^[2]; Samukawa, S. ^[3]

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1. Austin Plasma Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741 (United States)
2. Tokyo Electron Limited, TEL Technology Center Sendai, 2-1 Osawa 3-chome, Izumi-ku, Sendai 981-3137 (Japan)
3. Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)

Plasma generated vacuum ultraviolet (VUV) in diffusion plasma excited by a microwave surface wave has been studied by using dielectric-based VUV sensors. Evolution of plasma VUV in the diffusion plasma as a function of the distance from the power coupling surface is investigated. Experimental results have indicated that the energy and spatial distributions of plasma VUV are mainly controlled by the energy distribution functions of the plasma electrons, i.e., electron energy distribution functions (EEDFs). The study implies that by designing EEDF of plasma, one could be able to tailor plasma VUV in different applications such as in dielectric etching or photo resist smoothing.

• OSTI ID: 22122817
• Journal Information: Applied Physics Letters, Vol. 103, Issue 3; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
DESIGN
DIELECTRIC MATERIALS
DIFFUSION
ENERGY SPECTRA
EVOLUTION
EXCITED STATES
FAR ULTRAVIOLET RADIATION
LIGHT TRANSMISSION
MICROWAVE RADIATION
PLASMA DIAGNOSTICS
SENSORS
SPATIAL DISTRIBUTION
SURFACES
WAVE PROPAGATION