Plasma resonances in a microwave-driven microdischarge

Journal Article · Mon Feb 06 00:00:00 EST 2012 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3681146· OSTI ID:22025433

Xue, J; Urdahl, R S; Cooley, J E ^[1]

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1. Agilent Labs, Agilent Technologies, 5301 Stevens Creek Blvd., Santa Clara, California 95051 (United States)

This work investigates resonances in a capacitively coupled, low pressure krypton microdischarge operated at 2.5 GHz. A circuit model for the device, which has a length dimension of approximately 1 mm, calculates impedance values for a range of electron densities. The model results predict several 'parallel' and 'series' resonances at the driving frequency when the electron density is approximately 8 x 10{sup 11} cm{sup -3} and 5 x 10{sup 12} cm{sup -3}. The series resonance occurs when the resistance approaches the output impedance of the radio-frequency signal source, minimizing the reflected power. These resonances explain an experimentally observed jump in intensity with increasing input power.

• OSTI ID: 22025433
• Journal Information: Applied Physics Letters, Vol. 100, Issue 6; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ELECTRON DENSITY
GHZ RANGE
HIGH-FREQUENCY DISCHARGES
IMPEDANCE
KRYPTON
MICROWAVE RADIATION
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA PRESSURE
RADIOWAVE RADIATION
RESONANCE