Stability of Ag nanocrystals synthesized by ultra-low energy ion implantation in SiO{sub 2} matrices
- Groupe Nanomat, CEMES-CNRS et Universite de Toulouse, 29 rue Jeanne Marvig - BP 94347 - 31055 Toulouse Cedex 4 (France)
- Laboratorio MDM, IMM-CNR, via C Olivetti 2, I-20864 Agrate Brianza (MB) (Italy)
Ultra low energy ion implantation is a promising technique for the wafer-scale fabrication of Silver nanoparticle planar arrays embedded in thermal silica on silicon substrate. The stability versus time of these nanoparticles is studied at ambient conditions on a time scale of months. The plasmonic signature of Ag NPs vanishes several months after implantation for as-implanted samples, while samples annealed at intermediate temperature under N{sub 2} remain stable. XPS and HREM analysis evidence the presence of Silver oxide nanoparticles on aged samples and pure Silver nanoparticles on the annealed ones. This thermal treatment does not modify the size-distribution or position of the particles but is very efficient in stabilizing the metallic particles and to prevent any form of oxidation.
- OSTI ID:
- 21560262
- Journal Information:
- Journal of Applied Physics, Vol. 109, Issue 10; Other Information: DOI: 10.1063/1.3592254; (c) 2011 American Institute of Physics; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ANNEALING
DISTRIBUTION
ION IMPLANTATION
MATRIX MATERIALS
NANOSTRUCTURES
OXIDATION
SILICA
SILICON
SILICON OXIDES
SILVER
SILVER OXIDES
STABILITY
SUBSTRATES
TRANSMISSION ELECTRON MICROSCOPY
X-RAY PHOTOELECTRON SPECTROSCOPY
CHALCOGENIDES
CHEMICAL REACTIONS
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
HEAT TREATMENTS
MATERIALS
METALS
MICROSCOPY
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
SEMIMETALS
SILICON COMPOUNDS
SILVER COMPOUNDS
SPECTROSCOPY
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS