skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Semiconductor Ion Implanters

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3586054· OSTI ID:21513401
 [1];  [2]
  1. Isys, 2727 Walsh Ave., Suite 103, Santa Clara, CA 95051 (United States)
  2. Group 3, LLC, Sunnyvale, CA 94086 (United States)

In 1953 the Raytheon CK722 transistor was priced at $7.60. Based upon this, an Intel Xeon Quad Core processor containing 820,000,000 transistors should list at $6.2 billion. Particle accelerator technology plays an important part in the remarkable story of why that Intel product can be purchased today for a few hundred dollars. Most people of the mid twentieth century would be astonished at the ubiquity of semiconductors in the products we now buy and use every day. Though relatively expensive in the nineteen fifties they now exist in a wide range of items from high-end multicore microprocessors like the Intel product to disposable items containing 'only' hundreds or thousands like RFID chips and talking greeting cards. This historical development has been fueled by continuous advancement of the several individual technologies involved in the production of semiconductor devices including Ion Implantation and the charged particle beamlines at the heart of implant machines. In the course of its 40 year development, the worldwide implanter industry has reached annual sales levels around $2B, installed thousands of dedicated machines and directly employs thousands of workers. It represents in all these measures, as much and possibly more than any other industrial application of particle accelerator technology. This presentation discusses the history of implanter development. It touches on some of the people involved and on some of the developmental changes and challenges imposed as the requirements of the semiconductor industry evolved.

OSTI ID:
21513401
Journal Information:
AIP Conference Proceedings, Vol. 1336, Issue 1; Conference: CAARI 2010: 21. International Conference on the Application of Accelerators in Research and Industry, Fort Worth, TX (United States), 8-13 Aug 2010; Other Information: DOI: 10.1063/1.3586054; (c) 2011 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English