Deposition And Characterization of (Ti,Zr)N Thin Films Grown Through PAPVD By The Pulsed Arc Technique
- Laboratorio de Fisica del Plasma, Universidad Nacional de Colombia, Sede Manizales, Cra 27 No. 64-60, Manizales (Colombia)
The Plasma Assisted Physic Vapor Deposition (PAPVD) by the pulsed arc technique has been used for deposition of Titanium Zirconium Nitride (Ti,Zr)N coatings, using a segmented target of TiZr. The deposition was performed in a vacuum chamber with two faced electrodes (target and substrate) using nitrogen as working gas, and a power-controlled source used to produce the arc discharges. Films were deposited on stainless steel 304, and they were characterized using the X-Ray Photoelectron Spectroscopy (XPS), X-Ray Diffraction (XRD), Energy Dispersion Spectroscopy (EDS) and Scanning Probe Microscopy (SPM) techniques. The XRD patterns show different planes in which the film grows. Through SPM, using Atomic Force Microscopy (AFM) and Lateral Force Microscopy (LFM) modes, a nanotribologic study of the thin film was made, determining hardness and friction coefficient.
- OSTI ID:
- 20898804
- Journal Information:
- AIP Conference Proceedings, Vol. 875, Issue 1; Conference: 16. IAEA technical meeting on research using small fusion devices; 11. Latin American workshop on plasma physics, Mexico City (Mexico), 30 Nov - 3 Dec 2005; 5-9 Dec 2005; Other Information: DOI: 10.1063/1.2405938; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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