Photoemission study of tris(8-hydroxyquinoline) aluminum/aluminum oxide/tris(8-hydroxyquinoline) aluminum interface

Journal Article · Fri Dec 01 00:00:00 EST 2006 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2397292· OSTI ID:20884913

Huanjun, Ding; Zorba, Serkan; Yongli, Gao; Liping, Ma; Yang, Yang ^[1]

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1. Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627 (United States)

The evolution of the interface electronic structure of a sandwich structure involving aluminum oxide and tris(8-hydroxyquinoline) aluminum (Alq), i.e. (Alq/AlO{sub x}/Alq), has been investigated with photoemission spectroscopy. Strong chemical reactions have been observed due to aluminum deposition onto the Alq substrate. The subsequent oxygen exposure releases some of the Alq molecules from the interaction with aluminum. Finally, the deposition of the top Alq layer leads to an asymmetry in the electronic energy level alignment with respect to the AlO{sub x} interlayer.

• OSTI ID: 20884913
• Journal Information: Journal of Applied Physics, Vol. 100, Issue 11; Other Information: DOI: 10.1063/1.2397292; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
ALUMINIUM OXIDES
ASYMMETRY
CHEMICAL REACTIONS
DEPOSITION
ELECTRONIC STRUCTURE
INTERFACES
LAYERS
ORGANIC SEMICONDUCTORS
OXINE
OXYGEN
PHOTOEMISSION
SUBSTRATES
ULTRAVIOLET RADIATION
X-RAY PHOTOELECTRON SPECTROSCOPY