Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

Journal Article · Mon Dec 25 00:00:00 EST 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2425044· OSTI ID:20880192

Gans, T; Schulze, J; O'Connell, D; Czarnetzki, U; Faulkner, R; Ellingboe, A R; Turner, M M ^[1]

---

1. Institute for Plasma and Atomic Physics, CPST, Ruhr-University Bochum, 44780 Bochum (Germany)

An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor (Exelan registered , Lam Research) has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.

• OSTI ID: 20880192
• Journal Information: Applied Physics Letters, Vol. 89, Issue 26; Other Information: DOI: 10.1063/1.2425044; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
EMISSION SPECTROSCOPY
ETCHING
HIGH-FREQUENCY DISCHARGES
IONIZATION
LANGMUIR FREQUENCY
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
RADIOWAVE RADIATION