Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation
Journal Article
·
· AIP Conference Proceedings
- PLASMANT, Dept. of Chemistry, University of Antwerp (Ukraine), Universiteitsplein 1, 2610 Wilrijk (Belgium)
- FOM Institute for Plasma Physics 'Rijnhuizen', Association EURATOM-FOM, Trilateral Euregio Cluster, P.O. Box 1207, 3430 BE Nieuwegein (Netherlands)
A self-consistent 1D fluid model is used to investigate the formation, growth and transport mechanisms of sub-micrometer particles in a low pressure capacitively coupled radio-frequency silane (SiH4) discharge. In this contribution we analyze the competition between the different forces governing the transport of nanometer-sized particles and the specific role of the thermophoretic force arising from a thermal gradient in gas temperature induced by heating or cooling of the electrodes. Further growth of the nanoparticles due to coagulation is also described by coupling the 1D fluid model with an aerosol dynamics model.
- OSTI ID:
- 20726747
- Journal Information:
- AIP Conference Proceedings, Vol. 799, Issue 1; Conference: 4. international conference on the physics of dusty plasmas, Orleans (France), 13-17 Jun 2005; Other Information: DOI: 10.1063/1.2134600; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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