Structural and optical characterization of WO{sub 3} thin films for gas sensor applications
- Lasers Department, Institute of Atomic Physics, P. O. Box MG 36, 76900 Bucharest V (Romania)
The structure, chemical composition, and optical properties of tungsten trioxide thin films grown by pulsed laser deposition were investigated. An ultraviolet KrF{sup *} excimer laser ({lambda}=248 nm, {tau}{sub FWHM} congruent with 20 ns, {nu}=2 Hz) was used for irradiation of tungsten trioxide targets in oxygen atmosphere. Our research focused on the effect of the ambient gas pressure and substrate temperature on the chemical composition, crystalline status, and optical properties of the obtained thin films. To this end, the films were studied by x-ray diffractometry Raman spectroscopy, and energy dispersive x-ray spectroscopy. Optical transmittance measurements were performed with a double beam spectrometer within the 400-1200 nm range. The films deposited at oxygen pressure values higher than 10 Pa and substrate temperatures above 300 deg. C consist of crystalline tungsten trioxide. Their average transmittance in the visible-infrared spectral region reaches about 85% appropriate for the envisaged applications.
- OSTI ID:
- 20713918
- Journal Information:
- Journal of Applied Physics, Vol. 97, Issue 9; Other Information: DOI: 10.1063/1.1889246; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ATMOSPHERES
CHEMICAL ANALYSIS
CHEMICAL COMPOSITION
ENERGY BEAM DEPOSITION
INFRARED SPECTRA
KRYPTON FLUORIDE LASERS
LASER RADIATION
MORPHOLOGY
OPTICAL PROPERTIES
PULSED IRRADIATION
RAMAN SPECTRA
RAMAN SPECTROSCOPY
SPECTROMETERS
SUBSTRATES
THIN FILMS
TUNGSTEN OXIDES
ULTRAVIOLET RADIATION
VISIBLE SPECTRA
X-RAY DIFFRACTION
X-RAY SPECTROSCOPY