Poly(cyclohexylethylene)- block -poly(ethylene oxide) Block Polymers for Metal Oxide Templating
Journal Article
·
· ACS Macro Letters
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Sponsoring Organization:
- NSFINDUSTRY
- OSTI ID:
- 1249246
- Journal Information:
- ACS Macro Letters, Vol. 4, Issue 9; ISSN 2161-1653
- Country of Publication:
- United States
- Language:
- ENGLISH
Novel Post-Treatment Approaches to Tailor the Pore Size of PS- b -PHEMA Isoporous Membranes
|
journal | August 2018 |
Similar Records
Poly(cyclohexylethylene)-block-poly(ethylene oxide) block polymers for metal oxide templating
Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography
Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography.
Journal Article
·
Tue Sep 01 00:00:00 EDT 2015
· ACS Macro Letters
·
OSTI ID:1249246
Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography
Journal Article
·
Thu Aug 07 00:00:00 EDT 2014
· Macromolecules
·
OSTI ID:1249246
+1 more
Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography.
Journal Article
·
Wed Jan 01 00:00:00 EST 2014
· Macromolecules
·
OSTI ID:1249246
+1 more