Multiple complementary gas distribution assemblies
In one embodiment, an apparatus includes a first gas distribution assembly that includes a first gas passage for introducing a first process gas into a second gas passage that introduces the first process gas into a processing chamber and a second gas distribution assembly that includes a third gas passage for introducing a second process gas into a fourth gas passage that introduces the second process gas into the processing chamber. The first and second gas distribution assemblies are each adapted to be coupled to at least one chamber wall of the processing chamber. The first gas passage is shaped as a first ring positioned within the processing chamber above the second gas passage that is shaped as a second ring positioned within the processing chamber. The gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.
- Research Organization:
- Applied Materials, Inc., Santa Clara, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- EE0003331
- Assignee:
- Applied Materials, Inc. (Santa Clara, CA)
- Patent Number(s):
- 9,303,318
- Application Number:
- 13/649,488
- OSTI ID:
- 1245459
- Resource Relation:
- Patent File Date: 2012 Oct 11
- Country of Publication:
- United States
- Language:
- English
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