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Title: Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers

Authors:
; ; ;  [1]
  1. UMM
Publication Date:
OSTI Identifier:
1237762
Resource Type:
Journal Article
Resource Relation:
Journal Name: ACS Applied Materials and Interfaces; Journal Volume: 7; Journal Issue: (49) ; 12, 2015
Research Org:
Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
Sponsoring Org:
NSFINDUSTRY
Country of Publication:
United States
Language:
ENGLISH