Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers
Journal Article
·
· ACS Applied Materials and Interfaces
- UMM
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Sponsoring Organization:
- NSFINDUSTRY
- OSTI ID:
- 1237762
- Journal Information:
- ACS Applied Materials and Interfaces, Vol. 7, Issue (49) ; 12, 2015; ISSN 1944-8244
- Country of Publication:
- United States
- Language:
- ENGLISH
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