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Title: Identifying different stacking sequences in few-layer CVD-grown Mo S 2 by low-energy atomic-resolution scanning transmission electron microscopy

Journal Article · · Physical Review B
 [1];  [2];  [3];  [3];  [4];  [5];  [1]
  1. Univ. of California, Berkeley, CA (United States). Department of Physics and Kavli Energy NanoSciences Institute; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Science Division
  2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Electrochemical Technologies Group; Illinois Institute of Technology, Chicago, IL (United States). Department of Mechanical, Materials and Aerospace Engineering
  3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). National Center for Electron Microscopy, Molecular Foundry
  4. Northwestern Univ., Evanston, IL (United States). Department of Materials Science and Engineering
  5. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Electrochemical Technologies Group

We present that atomically thin MoS2 grown by chemical vapor deposition (CVD) is a promising candidate for next-generation electronics due to inherent CVD scalability and controllability. However, it is well known that the stacking sequence in few-layer MoS2 can significantly impact electrical and optical properties. Herein we report different intrinsic stacking sequences in CVD-grown few-layer MoS2 obtained by atomic-resolution annular-dark-field imaging in an aberration-corrected scanning transmission electron microscope operated at 50 keV. Trilayer MoS2 displays a new stacking sequence distinct from the commonly observed 2H and 3R phases of MoS2. Finally, density functional theory is used to examine the stability of different stacking sequences, and the findings are consistent with our experimental observations.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC02-05CH11231; EDCBEE
OSTI ID:
1379044
Alternate ID(s):
OSTI ID: 1235955
Journal Information:
Physical Review B, Vol. 93, Issue 4; ISSN 2469-9950
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 43 works
Citation information provided by
Web of Science

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Cited By (8)

Atomic Vacancy Control and Elemental Substitution in a Monolayer Molybdenum Disulfide for High Performance Optoelectronic Device Arrays journal January 2020
Differentiating Polymorphs in Molybdenum Disulfide via Electron Microscopy journal August 2018
Healing of Planar Defects in 2D Materials via Grain Boundary Sliding journal February 2019
Facile, Rapid, and Well‐Controlled Preparation of Pt Nanoparticles Decorated on Single Surface of Mos 2 Nanosheets and Application in HER journal January 2020
Stacking-controllable interlayer coupling and symmetric configuration of multilayered MoS2 journal February 2018
Stacking change in MoS2 bilayers induced by interstitial Mo impurities journal February 2018
Twist Angle mapping in layered WS2 by Polarization-Resolved Second Harmonic Generation journal October 2019
Twist Angle mapping in layered WS2 by Polarization-Resolved Second Harmonic Generation preprint January 2019

Figures / Tables (4)


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