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Title: Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
OSTI Identifier:
1163273
Report Number(s):
LBNL-6733E
DOE Contract Number:
DE-AC02-05CH11231
Resource Type:
Conference
Resource Relation:
Conference: SPIE - Extreme Ultraviolet (EUV) Lithography V, San Jose, CA, February 23, 2014; Related Information: Journal Publication Date: 90481M
Research Org:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
Sponsoring Org:
Materials Sciences Division
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE