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Title: Polymeric matrix materials for infrared metamaterials

Patent ·
OSTI ID:1129387

A polymeric matrix material exhibits low loss at optical frequencies and facilitates the fabrication of all-dielectric metamaterials. The low-loss polymeric matrix material can be synthesized by providing an unsaturated polymer, comprising double or triple bonds; partially hydrogenating the unsaturated polymer; depositing a film of the partially hydrogenated polymer and a crosslinker on a substrate; and photopatterning the film by exposing the film to ultraviolet light through a patterning mask, thereby cross-linking at least some of the remaining unsaturated groups of the partially hydrogenated polymer in the exposed portions.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
8,703,391
Application Number:
13/305,837
OSTI ID:
1129387
Resource Relation:
Patent File Date: 2011 Nov 29
Country of Publication:
United States
Language:
English

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Thiol-Ene Click Chemistry journal February 2010
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Strong Coupling between Nanoscale Metamaterials and Phonons journal May 2011
Modelling of isotropic double negative media for microwave applications journal January 2006

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