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Title: Behavior of deuterium retention and surface morphology for VPS–W/F82H

The deuterium (D) retention for Vacuum Plasma Spray (VPS)–tungsten (W)/F82H was studied using two different implantation methods, namely D plasma exposure and View the MathML source implantation. The D retention for polished VPS–W/F82H after plasma exposure was found to be reduced compared to that for polycrystalline tungsten. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) observations indicated that porous structures around grain boundaries and the interface between VPS–W layers would be potential D diffusion paths, leading to low D retention. In the case of View the MathML source implantation, the shape of D2 TDS spectrum was almost the same as that for D plasma-exposed VPS–W/F82H; however, the D retention was quite high for unpolished VPS–W/F82H, indicating that most of D was trapped by the oxide layer, which was produced by the VPS process. The reduction of surface area due to the polishing process also reduces D retention for VPS–W/F82H. These results indicate that controlling the surface chemical states is important for the reduction of tritium retention for future fusion reactors.
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Publication Date:
OSTI Identifier:
Report Number(s):
DOE Contract Number:
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Nuclear Materials; Journal Volume: 442; Journal Issue: 1 - 3, Supplement 1
Research Org:
Idaho National Laboratory (INL)
Sponsoring Org:
Country of Publication:
United States
99 GENERAL AND MISCELLANEOUS; deuterium retention