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Title: Adatom Ascending at Step Edges and Faceting on fcc Metal (110) Surfaces

Journal Article · · Physical Review Letters
 [1];  [2];  [3];  [4];  [5]
  1. Chinese Academy of Sciences
  2. INFM-Unita di Genova and Dipartimento di Fisica, Italy
  3. INFM-Trinta di Genova and Dipartimento di Fisica, Italy
  4. International Center for Quantum Structures and Institute of Physics, China
  5. ORNL

Using first-principles total-energy calculations, we show that an adatom can easily climb up at monatomic-layer-high steps on several representative fcc metal (110) surfaces via a place exchange mechanism. Inclusion of such novel adatom ascending processes in kinetic Monte Carlo simulations of Al(110) homoepitaxy as a prototypical model system can lead to the existence of an intriguing faceting instability, whose dynamical evolution and kinetic nature are explored in comparison with experimental observations.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
DE-AC05-00OR22725
OSTI ID:
1003048
Journal Information:
Physical Review Letters, Vol. 92, Issue 10; ISSN 0031--9007
Country of Publication:
United States
Language:
English

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