Adatom Ascending at Step Edges and Faceting on fcc Metal (110) Surfaces
Journal Article
·
· Physical Review Letters
- Chinese Academy of Sciences
- INFM-Unita di Genova and Dipartimento di Fisica, Italy
- INFM-Trinta di Genova and Dipartimento di Fisica, Italy
- International Center for Quantum Structures and Institute of Physics, China
- ORNL
Using first-principles total-energy calculations, we show that an adatom can easily climb up at monatomic-layer-high steps on several representative fcc metal (110) surfaces via a place exchange mechanism. Inclusion of such novel adatom ascending processes in kinetic Monte Carlo simulations of Al(110) homoepitaxy as a prototypical model system can lead to the existence of an intriguing faceting instability, whose dynamical evolution and kinetic nature are explored in comparison with experimental observations.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 1003048
- Journal Information:
- Physical Review Letters, Vol. 92, Issue 10; ISSN 0031--9007
- Country of Publication:
- United States
- Language:
- English
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