Single Ion Implantation
Abstract
On the equipment needed to implant ions in silicon and other materials. More information: http://newscenter.lbl.gov/feature-stories/2008/10/22/a-toolkit-for-silicon-based-quantum-computing/
- Authors:
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1047555
- Resource Type:
- Multimedia
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE; NANOTECHNOLOGY; QUANTUM; COMPUTING; LBNL; LAWRENCE; BERKELEY; IONS; SILICON
Citation Formats
Schenkel, Thomas, Weis, Christoph, and Persaud, Arun. Single Ion Implantation. United States: N. p., 2008.
Web.
Schenkel, Thomas, Weis, Christoph, & Persaud, Arun. Single Ion Implantation. United States.
Schenkel, Thomas, Weis, Christoph, and Persaud, Arun. Tue .
"Single Ion Implantation". United States. https://www.osti.gov/servlets/purl/1047555.
@article{osti_1047555,
title = {Single Ion Implantation},
author = {Schenkel, Thomas and Weis, Christoph and Persaud, Arun},
abstractNote = {On the equipment needed to implant ions in silicon and other materials. More information: http://newscenter.lbl.gov/feature-stories/2008/10/22/a-toolkit-for-silicon-based-quantum-computing/},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 21 00:00:00 EDT 2008},
month = {Tue Oct 21 00:00:00 EDT 2008}
}