skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Single Ion Implantation

Abstract

On the equipment needed to implant ions in silicon and other materials. More information: http://newscenter.lbl.gov/feature-stories/2008/10/22/a-toolkit-for-silicon-based-quantum-computing/

Authors:
; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1047555
Resource Type:
Multimedia
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE; NANOTECHNOLOGY; QUANTUM; COMPUTING; LBNL; LAWRENCE; BERKELEY; IONS; SILICON

Citation Formats

Schenkel, Thomas, Weis, Christoph, and Persaud, Arun. Single Ion Implantation. United States: N. p., 2008. Web.
Schenkel, Thomas, Weis, Christoph, & Persaud, Arun. Single Ion Implantation. United States.
Schenkel, Thomas, Weis, Christoph, and Persaud, Arun. Tue . "Single Ion Implantation". United States. https://www.osti.gov/servlets/purl/1047555.
@article{osti_1047555,
title = {Single Ion Implantation},
author = {Schenkel, Thomas and Weis, Christoph and Persaud, Arun},
abstractNote = {On the equipment needed to implant ions in silicon and other materials. More information: http://newscenter.lbl.gov/feature-stories/2008/10/22/a-toolkit-for-silicon-based-quantum-computing/},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2008},
month = {10}
}

Multimedia:

Save / Share:
Save to Playlist
You must Sign In or Create an Account in order to save documents to your library.