Molecular dynamics simulations of reflection and sputtering behavior of boron under deuterium ion irradiation

Journal Article · Thu Mar 05 00:00:00 UTC 2026 · Journal of Nuclear Materials

DOI: https://doi.org/10.1016/j.jnucmat.2026.156567 · OSTI ID:3024046

Schamis, H.  ^[1]; Enriquez, J. I.  ^[1]; Ethier, S. A.  ^[1]; Kaganovich, I. D.  ^[1]

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1. Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)

Boronization is a commonly used method of wall conditioning in fusion reactors. The application of boron films to the plasma-facing materials results in enhanced plasma performance due to the reduction of intrinsic impurities. This is primarily driven by a reduction in oxygen content that is chemically trapped in the boron film. The reactive nature of these boron films also raises questions concerning interactions with hydrogen isotopes. In this work, boron-deuterium interactions were studied using molecular dynamics (MD). Reactive force field potentials were used to model the chemical interactions between B and D. An amorphous boron substrate was irradiated by D atoms at varying incident energies, 10 eV < E_i < 150 eV and angles, 0° < α < 85°. The reflection probability was calculated and compared to results from the commonly-used binary collision approximation (BCA) method. This comparison found that the BCA underestimated the reflection probability at E_i < 35 eV and α > 45^∘. The source of this discrepancy was found to be the surface binding energy model. The BCA calculation with an isotropic surface binding energy model was more closely aligned to the MD result. This, in combination with a correction function based on the MD results allows for corrections to the reflection probability of deuterium impinging on boron surfaces. The sputtering of the substrate material was also studied. While this study did not contain sufficient events to quantitatively describe the sputtering behavior, some qualitative results emerged: namely, chemical sputtering of B and D-containing molecules (BD, BD₂, BD₃) at low ( < 20 eV) incident deuterium energies. This result suggests that chemical sputtering could be a significant factor in limiting boron coating lifetime when exposed to lower ion energies, such as those in detached plasmas. The results show that chemical interactions should be taken into account when modeling the interactions between D ions and B surfaces.

• Research Organization: Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)
• Sponsoring Organization: National Energy Research Scientific Computing Center (NERSC); USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Science (SC)
• Grant/Contract Number: AC02-09CH11466
• OSTI ID: 3024046
• Journal Information: Journal of Nuclear Materials, Journal Name: Journal of Nuclear Materials Vol. 626; ISSN 0022-3115
• Publisher: ElsevierCopyright Statement
• Country of Publication: United States
• Language: English