Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source

Kim, Youngsuk; Baule, Nina; Shrestha, Maheshwar; Fan, Qi Hua

doi:10.3390/coatings12081159

Title: Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source

Journal Article · 11 August 2022 · Coatings

DOI: https://doi.org/10.3390/coatings12081159 · OSTI ID:1880892

; Baule, Nina;

; Fan, Qi Hua

A single beam plasma source was used to deposit hydrogenated amorphous carbon (a-C:H) coatings at room temperature. Using methane source gas, a-C:H coatings were deposited at different radio frequency (RF) power to fabricate transparent and durable coatings. The film deposition rate was almost linearly proportional to the ion source power. Hydrogenated amorphous carbon films of ~100 nm thickness appeared to be highly transparent from UV to the infrared range with a transmittance of ~90% and optical bandgap of ~3.7 eV. The coatings also possess desirable mechanical properties with Young’s modulus of ~78 GPa and density of ~1.9 g/cm3. The combined material properties of high transmittance and high durability make the ion-source-deposited a-C:H coatings attractive for many applications.

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Research Organization:: Scion Plasma LLC, East Lansing, MI (United States)

Sponsoring Organization:: National Science Foundation; USDOE

Grant/Contract Number:: EE0009018

OSTI ID:: 1880892

Journal Information:: Coatings, Journal Name: Coatings Journal Issue: 8 Vol. 12; ISSN 2079-6412; ISSN COATED

Publisher:: MDPI AGCopyright Statement

Country of Publication:: Switzerland

Language:: English

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36 MATERIALS SCIENCE
ion source
plasma-enhanced chemical vapor deposition
transparent carbon film

Title: Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source

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