A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief
Abstract
Temperature-induced metal–insulator transition (MIT) in vanadium dioxide (VO2) has been under intense research interest for decades both theoretically and experimentally. Due to the complex nature of electron correlations, the underlying physics behind the MIT in VO2 has yet to be fully grasped. In this work, we utilize the fine resolution of the scattering-type scanning near-field optical microscope to investigate the MIT in an epitaxial VO2 thin film on the (100)R TiO2 substrate with mid-infrared light. Bidirectional tweed-like metal–insulator phase coexistence patterns are observed and understood under the Landau free energy paradigm. More interestingly, delayed metallic nucleation is observed near the surface cracks due to local strain relief. This research proposes ideas in investigating the temperature–pressure phase diagram and tuning the interplay between local strain and MIT in oxide thin films.
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1875941
- Grant/Contract Number:
- SC0012704
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 121 Journal Issue: 2; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Chen, Xinzhong, Kittiwatanakul, Salinporn, Cheng, Yinke, Slusar, Tetiana V., Mcleod, Alexander S., Li, Zhuoqi, Kim, Hyun-Tak, Basov, D. N., and Liu, Mengkun. A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief. United States: N. p., 2022.
Web. doi:10.1063/5.0099142.
Chen, Xinzhong, Kittiwatanakul, Salinporn, Cheng, Yinke, Slusar, Tetiana V., Mcleod, Alexander S., Li, Zhuoqi, Kim, Hyun-Tak, Basov, D. N., & Liu, Mengkun. A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief. United States. https://doi.org/10.1063/5.0099142
Chen, Xinzhong, Kittiwatanakul, Salinporn, Cheng, Yinke, Slusar, Tetiana V., Mcleod, Alexander S., Li, Zhuoqi, Kim, Hyun-Tak, Basov, D. N., and Liu, Mengkun. Tue .
"A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief". United States. https://doi.org/10.1063/5.0099142.
@article{osti_1875941,
title = {A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief},
author = {Chen, Xinzhong and Kittiwatanakul, Salinporn and Cheng, Yinke and Slusar, Tetiana V. and Mcleod, Alexander S. and Li, Zhuoqi and Kim, Hyun-Tak and Basov, D. N. and Liu, Mengkun},
abstractNote = {Temperature-induced metal–insulator transition (MIT) in vanadium dioxide (VO2) has been under intense research interest for decades both theoretically and experimentally. Due to the complex nature of electron correlations, the underlying physics behind the MIT in VO2 has yet to be fully grasped. In this work, we utilize the fine resolution of the scattering-type scanning near-field optical microscope to investigate the MIT in an epitaxial VO2 thin film on the (100)R TiO2 substrate with mid-infrared light. Bidirectional tweed-like metal–insulator phase coexistence patterns are observed and understood under the Landau free energy paradigm. More interestingly, delayed metallic nucleation is observed near the surface cracks due to local strain relief. This research proposes ideas in investigating the temperature–pressure phase diagram and tuning the interplay between local strain and MIT in oxide thin films.},
doi = {10.1063/5.0099142},
journal = {Applied Physics Letters},
number = 2,
volume = 121,
place = {United States},
year = {Tue Jul 12 00:00:00 EDT 2022},
month = {Tue Jul 12 00:00:00 EDT 2022}
}
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