Tuning the Relative Strengths of Electromechanical Resonances Using Non-Uniform Polarization of Piezoelectric Wafers

Guha, Anurup; Pantea, Cristian; Chillara, Vamshi Krishna

doi:10.1109/OJUFFC.2021.3134935

Title: Tuning the Relative Strengths of Electromechanical Resonances Using Non-Uniform Polarization of Piezoelectric Wafers

Journal Article · 31 December 2021 · IEEE Open Journal of Ultrasonics, Ferroelectrics, and Frequency Control

DOI: https://doi.org/10.1109/OJUFFC.2021.3134935 · OSTI ID:1835156

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Research Organization:: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)

Sponsoring Organization:: USDOE; USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: 89233218CNA000001

OSTI ID:: 1835156

Report Number(s):: LA-UR-21-27837; 9646958

Journal Information:: IEEE Open Journal of Ultrasonics, Ferroelectrics, and Frequency Control, Journal Name: IEEE Open Journal of Ultrasonics, Ferroelectrics, and Frequency Control Vol. 2; ISSN 2694-0884

Publisher:: Institute of Electrical and Electronics EngineersCopyright Statement

Country of Publication:: United States

Language:: English

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Title: Tuning the Relative Strengths of Electromechanical Resonances Using Non-Uniform Polarization of Piezoelectric Wafers

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