Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment
Abstract
Conditioning of plasma facing components (PFCs) using lithium (Li) evaporation has shown to improve plasma performance in fusion devices by imposing low recycling boundary conditions. It is important to understand the retention and sputtering dynamics of deuterium (D) in Li and Li compound (Li-O and Li-C-O) films to most efficiently make predictions on plasma performance. Energetic D2+ incident on thin Li films is shown to readily form LiD leading to a lower Li sputtering yield than the sputtering yield of pure Li. Measured sputtering yields for thin LiD films agree with previous simulations and bulk erosion measurements. The He+ sputtering yield of pure Li was 2-3 times higher than the sputtering yield of D2+ on LiD. Incident 1000-1200 eV/D2+ sputtered Li-O films at a slower rate than D2+ on LiD and Li-C-O films.
- Authors:
- Publication Date:
- Research Org.:
- Princeton Univ., NJ (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Fusion Energy Sciences (FES)
- OSTI Identifier:
- 1529739
- Alternate Identifier(s):
- OSTI ID: 1571885
- Report Number(s):
- DOE-PU-0012890-7
Journal ID: ISSN 2352-1791; S2352179118302473; PII: S2352179118302473
- Grant/Contract Number:
- SC0012890; AC02-09CH11466
- Resource Type:
- Published Article
- Journal Name:
- Nuclear Materials and Energy
- Additional Journal Information:
- Journal Name: Nuclear Materials and Energy Journal Volume: 19 Journal Issue: C; Journal ID: ISSN 2352-1791
- Publisher:
- Elsevier
- Country of Publication:
- Netherlands
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; Deuterium retention; Lithium carbonate; Lithium deuteride; Sputtering; Thin films
Citation Formats
Buzi, L., Nelson, A. O., Yang, Y., Kaita, R., Krstić, P. S., and Koel, B. E. Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment. Netherlands: N. p., 2019.
Web. doi:10.1016/j.nme.2019.02.037.
Buzi, L., Nelson, A. O., Yang, Y., Kaita, R., Krstić, P. S., & Koel, B. E. Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment. Netherlands. https://doi.org/10.1016/j.nme.2019.02.037
Buzi, L., Nelson, A. O., Yang, Y., Kaita, R., Krstić, P. S., and Koel, B. E. Wed .
"Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment". Netherlands. https://doi.org/10.1016/j.nme.2019.02.037.
@article{osti_1529739,
title = {Sputtering of lithium and lithium compound films under deuterium and helium ion bombardment},
author = {Buzi, L. and Nelson, A. O. and Yang, Y. and Kaita, R. and Krstić, P. S. and Koel, B. E.},
abstractNote = {Conditioning of plasma facing components (PFCs) using lithium (Li) evaporation has shown to improve plasma performance in fusion devices by imposing low recycling boundary conditions. It is important to understand the retention and sputtering dynamics of deuterium (D) in Li and Li compound (Li-O and Li-C-O) films to most efficiently make predictions on plasma performance. Energetic D2+ incident on thin Li films is shown to readily form LiD leading to a lower Li sputtering yield than the sputtering yield of pure Li. Measured sputtering yields for thin LiD films agree with previous simulations and bulk erosion measurements. The He+ sputtering yield of pure Li was 2-3 times higher than the sputtering yield of D2+ on LiD. Incident 1000-1200 eV/D2+ sputtered Li-O films at a slower rate than D2+ on LiD and Li-C-O films.},
doi = {10.1016/j.nme.2019.02.037},
journal = {Nuclear Materials and Energy},
number = C,
volume = 19,
place = {Netherlands},
year = {Wed May 01 00:00:00 EDT 2019},
month = {Wed May 01 00:00:00 EDT 2019}
}
https://doi.org/10.1016/j.nme.2019.02.037
Web of Science