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Title: High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

While 3D-printing is currently experiencing significant growth and having a significant impact on science and technology, the expansion into the nanoworld is still a highly challenging task. Among the increasing number of approaches, focused electron-beam-induced deposition (FEBID) was recently demonstrated to be a viable candidate toward a generic direct-write fabrication technology with spatial nanometer accuracy for complex shaped 3D-nanoarchitectures. In this comprehensive study, we explore the parameter space for 3D-FEBID and investigate the implications of individual and interdependent parameters on freestanding nanosegments, which act as a fundamental building block for complex 3D-structures. In particular, the study provides new basic insights such as precursor transport limitations and angle dependent growth rates, both essential for high-fidelity fabrication. In conclusion, complemented by practical aspects, we provide both basic insights in 3D-growth dynamics and technical guidance for specific process adaption to enable predictable and reliable direct-write synthesis of freestanding 3D-nanoarchitectures.
Authors:
 [1] ;  [2] ; ORCiD logo [2] ; ORCiD logo [2] ; ORCiD logo [3]
  1. Graz Centre for Electron Microscopy, Graz (Austria)
  2. Univ. of Tennessee, Knoxville, TN (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  3. Graz Centre for Electron Microscopy, Graz (Austria); Graz Univ. of Technology, Graz (Austria)
Publication Date:
Grant/Contract Number:
AC05-00OR22725
Type:
Accepted Manuscript
Journal Name:
ACS Applied Nano Materials
Additional Journal Information:
Journal Volume: 1; Journal Issue: 3; Journal ID: ISSN 2574-0970
Research Org:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 3D-nanoprinting; additive manufacturing; direct-write; focused-electron-beam-induced deposition; nanofabrication
OSTI Identifier:
1439951

Winkler, Robert, Lewis, Brett B., Fowlkes, Jason Davidson, Rack, Philip D., and Plank, Harald. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals. United States: N. p., Web. doi:10.1021/acsanm.8b00158.
Winkler, Robert, Lewis, Brett B., Fowlkes, Jason Davidson, Rack, Philip D., & Plank, Harald. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals. United States. doi:10.1021/acsanm.8b00158.
Winkler, Robert, Lewis, Brett B., Fowlkes, Jason Davidson, Rack, Philip D., and Plank, Harald. 2018. "High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals". United States. doi:10.1021/acsanm.8b00158.
@article{osti_1439951,
title = {High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals},
author = {Winkler, Robert and Lewis, Brett B. and Fowlkes, Jason Davidson and Rack, Philip D. and Plank, Harald},
abstractNote = {While 3D-printing is currently experiencing significant growth and having a significant impact on science and technology, the expansion into the nanoworld is still a highly challenging task. Among the increasing number of approaches, focused electron-beam-induced deposition (FEBID) was recently demonstrated to be a viable candidate toward a generic direct-write fabrication technology with spatial nanometer accuracy for complex shaped 3D-nanoarchitectures. In this comprehensive study, we explore the parameter space for 3D-FEBID and investigate the implications of individual and interdependent parameters on freestanding nanosegments, which act as a fundamental building block for complex 3D-structures. In particular, the study provides new basic insights such as precursor transport limitations and angle dependent growth rates, both essential for high-fidelity fabrication. In conclusion, complemented by practical aspects, we provide both basic insights in 3D-growth dynamics and technical guidance for specific process adaption to enable predictable and reliable direct-write synthesis of freestanding 3D-nanoarchitectures.},
doi = {10.1021/acsanm.8b00158},
journal = {ACS Applied Nano Materials},
number = 3,
volume = 1,
place = {United States},
year = {2018},
month = {2}
}