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Title: Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2

Abstract

We report on a new oscillatory behavior of nanoscopic friction in continuous polycrystalline MoS 2 films for an odd and even number of atomic layers, related to the different in-plane polarization of crystalline grains and different capability of absorbing charged molecules.

Authors:
 [1]; ORCiD logo [2];  [3];  [4];  [3];  [5]; ORCiD logo [6];  [7]; ORCiD logo [8]; ORCiD logo [1]
  1. Advanced Science Research Center, City University of New York, New York, USA, CUNY Graduate Center
  2. Advanced Science Research Center, City University of New York, New York, USA, Tandon School of Engineering
  3. Advanced Science Research Center, City University of New York, New York, USA
  4. Advanced Science Research Center, City University of New York, New York, USA, Dipartimento di Fisica
  5. CUNY Graduate Center, Ph.D. Program in Physics and Chemistry, New York, USA, Department of Chemistry
  6. Department of Materials Science and Engineering, North Carolina State University, Raleigh, USA
  7. Department of Materials Science and Engineering, North Carolina State University, Raleigh, USA, Department of Physics
  8. Advanced Science Research Center, City University of New York, New York, USA, National Research Council CNR-SPIN
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1434380
Grant/Contract Number:  
SC0016204
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Nanoscale
Additional Journal Information:
Journal Name: Nanoscale Journal Volume: 10 Journal Issue: 17; Journal ID: ISSN 2040-3364
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Lavini, Francesco, Calò, Annalisa, Gao, Yang, Albisetti, Edoardo, Li, Tai-De, Cao, Tengfei, Li, Guoqing, Cao, Linyou, Aruta, Carmela, and Riedo, Elisa. Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2. United Kingdom: N. p., 2018. Web. doi:10.1039/C8NR00238J.
Lavini, Francesco, Calò, Annalisa, Gao, Yang, Albisetti, Edoardo, Li, Tai-De, Cao, Tengfei, Li, Guoqing, Cao, Linyou, Aruta, Carmela, & Riedo, Elisa. Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2. United Kingdom. doi:10.1039/C8NR00238J.
Lavini, Francesco, Calò, Annalisa, Gao, Yang, Albisetti, Edoardo, Li, Tai-De, Cao, Tengfei, Li, Guoqing, Cao, Linyou, Aruta, Carmela, and Riedo, Elisa. Mon . "Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2". United Kingdom. doi:10.1039/C8NR00238J.
@article{osti_1434380,
title = {Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2},
author = {Lavini, Francesco and Calò, Annalisa and Gao, Yang and Albisetti, Edoardo and Li, Tai-De and Cao, Tengfei and Li, Guoqing and Cao, Linyou and Aruta, Carmela and Riedo, Elisa},
abstractNote = {We report on a new oscillatory behavior of nanoscopic friction in continuous polycrystalline MoS 2 films for an odd and even number of atomic layers, related to the different in-plane polarization of crystalline grains and different capability of absorbing charged molecules.},
doi = {10.1039/C8NR00238J},
journal = {Nanoscale},
number = 17,
volume = 10,
place = {United Kingdom},
year = {2018},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1039/C8NR00238J

Citation Metrics:
Cited by: 1 work
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