Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2
Abstract
We report on a new oscillatory behavior of nanoscopic friction in continuous polycrystalline MoS 2 films for an odd and even number of atomic layers, related to the different in-plane polarization of crystalline grains and different capability of absorbing charged molecules.
- Authors:
-
- Advanced Science Research Center, City University of New York, New York, USA, CUNY Graduate Center
- Advanced Science Research Center, City University of New York, New York, USA, Tandon School of Engineering
- Advanced Science Research Center, City University of New York, New York, USA
- Advanced Science Research Center, City University of New York, New York, USA, Dipartimento di Fisica
- CUNY Graduate Center, Ph.D. Program in Physics and Chemistry, New York, USA, Department of Chemistry
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, USA
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, USA, Department of Physics
- Advanced Science Research Center, City University of New York, New York, USA, National Research Council CNR-SPIN
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1434380
- Grant/Contract Number:
- SC0016204
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Nanoscale
- Additional Journal Information:
- Journal Name: Nanoscale Journal Volume: 10 Journal Issue: 17; Journal ID: ISSN 2040-3364
- Publisher:
- Royal Society of Chemistry (RSC)
- Country of Publication:
- United Kingdom
- Language:
- English
Citation Formats
Lavini, Francesco, Calò, Annalisa, Gao, Yang, Albisetti, Edoardo, Li, Tai-De, Cao, Tengfei, Li, Guoqing, Cao, Linyou, Aruta, Carmela, and Riedo, Elisa. Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2. United Kingdom: N. p., 2018.
Web. doi:10.1039/C8NR00238J.
Lavini, Francesco, Calò, Annalisa, Gao, Yang, Albisetti, Edoardo, Li, Tai-De, Cao, Tengfei, Li, Guoqing, Cao, Linyou, Aruta, Carmela, & Riedo, Elisa. Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2. United Kingdom. https://doi.org/10.1039/C8NR00238J
Lavini, Francesco, Calò, Annalisa, Gao, Yang, Albisetti, Edoardo, Li, Tai-De, Cao, Tengfei, Li, Guoqing, Cao, Linyou, Aruta, Carmela, and Riedo, Elisa. Mon .
"Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2". United Kingdom. https://doi.org/10.1039/C8NR00238J.
@article{osti_1434380,
title = {Friction and work function oscillatory behavior for an even and odd number of layers in polycrystalline MoS 2},
author = {Lavini, Francesco and Calò, Annalisa and Gao, Yang and Albisetti, Edoardo and Li, Tai-De and Cao, Tengfei and Li, Guoqing and Cao, Linyou and Aruta, Carmela and Riedo, Elisa},
abstractNote = {We report on a new oscillatory behavior of nanoscopic friction in continuous polycrystalline MoS 2 films for an odd and even number of atomic layers, related to the different in-plane polarization of crystalline grains and different capability of absorbing charged molecules.},
doi = {10.1039/C8NR00238J},
journal = {Nanoscale},
number = 17,
volume = 10,
place = {United Kingdom},
year = {Mon Jan 01 00:00:00 EST 2018},
month = {Mon Jan 01 00:00:00 EST 2018}
}
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https://doi.org/10.1039/C8NR00238J
https://doi.org/10.1039/C8NR00238J
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Cited by: 28 works
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