Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction
Abstract
An operando x-ray diffraction system is presented for elucidating optimal laser assisted chemical vapor deposition growth conditions. The technique is utilized to investigate deposition dynamics of boron-carbon materials using trimethyl borate precursor. Trimethyl borate exhibits vastly reduced toxicological and flammability hazards compared to existing precursors, but has previously not been applied to boron carbide growth. Crystalline boron-rich carbide material is produced in a narrow growth regime on addition of hydrogen during the growth phase at high temperature. Finally, the use of the operando x-ray diffraction system allows for the exploration of highly nonequilibrium conditions and rapid process control, which are not possible using ex situ diagnostics.
- Authors:
-
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). Physical and Life Sciences Directorate
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1430996
- Alternate Identifier(s):
- OSTI ID: 1426005
- Report Number(s):
- LLNL-JRNL-717099
Journal ID: ISSN 2166-2746
- Grant/Contract Number:
- AC52-07NA27344; AC02-06CH11357
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Vacuum Science and Technology B
- Additional Journal Information:
- Journal Volume: 36; Journal Issue: 2; Journal ID: ISSN 2166-2746
- Publisher:
- American Vacuum Society/AIP
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Martin, Aiden A., Depond, Philip J., Bagge-Hansen, Michael, Lee, Jonathan R. I., Yoo, Jae-Hyuck, Elhadj, Selim, Matthews, Manyalibo J., and van Buuren, Tony. Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction. United States: N. p., 2018.
Web. doi:10.1116/1.5019742.
Martin, Aiden A., Depond, Philip J., Bagge-Hansen, Michael, Lee, Jonathan R. I., Yoo, Jae-Hyuck, Elhadj, Selim, Matthews, Manyalibo J., & van Buuren, Tony. Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction. United States. https://doi.org/10.1116/1.5019742
Martin, Aiden A., Depond, Philip J., Bagge-Hansen, Michael, Lee, Jonathan R. I., Yoo, Jae-Hyuck, Elhadj, Selim, Matthews, Manyalibo J., and van Buuren, Tony. Wed .
"Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction". United States. https://doi.org/10.1116/1.5019742. https://www.osti.gov/servlets/purl/1430996.
@article{osti_1430996,
title = {Rapid feedback of chemical vapor deposition growth mechanisms by operando X-ray diffraction},
author = {Martin, Aiden A. and Depond, Philip J. and Bagge-Hansen, Michael and Lee, Jonathan R. I. and Yoo, Jae-Hyuck and Elhadj, Selim and Matthews, Manyalibo J. and van Buuren, Tony},
abstractNote = {An operando x-ray diffraction system is presented for elucidating optimal laser assisted chemical vapor deposition growth conditions. The technique is utilized to investigate deposition dynamics of boron-carbon materials using trimethyl borate precursor. Trimethyl borate exhibits vastly reduced toxicological and flammability hazards compared to existing precursors, but has previously not been applied to boron carbide growth. Crystalline boron-rich carbide material is produced in a narrow growth regime on addition of hydrogen during the growth phase at high temperature. Finally, the use of the operando x-ray diffraction system allows for the exploration of highly nonequilibrium conditions and rapid process control, which are not possible using ex situ diagnostics.},
doi = {10.1116/1.5019742},
journal = {Journal of Vacuum Science and Technology B},
number = 2,
volume = 36,
place = {United States},
year = {Wed Mar 14 00:00:00 EDT 2018},
month = {Wed Mar 14 00:00:00 EDT 2018}
}
Web of Science