Search Menu
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information
Search Scholarly Publications

Title: Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O 2 Discharges by Using a Hybrid Model

Journal Article · · Plasma Processes and Polymers
 [1];  [2];  [3];  [4]
  1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology Dalian University of Technology Dalian 116024 China, Department of Electrical Engineering and Computer Sciences − 1770 University of California Berkeley 94720 California
  2. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology Dalian University of Technology Dalian 116024 China, Research Group PLASMANT, Department of Chemistry University of Antwerp Campus Drie Eiken, Universiteitsplein 1 BE‐2610 Wilrijk‐Antwerp Belgium
  3. Department of Electrical Engineering and Computer Sciences − 1770 University of California Berkeley 94720 California
  4. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology Dalian University of Technology Dalian 116024 China
+ Show Author Affiliations

In this work, a global bulk plasma model coupled bi‐directionally with a Monte‐Carlo/fluid sheath model was developed for electronegative inductive discharges, to explore the ion energy function (IEDF) and angular distributions function (IADF) bombarding an rf‐biased electrode. At low bias voltage, the IEDF of shows a single energy peak that transforms into a bimodal distribution with increasing bias voltage. The IEDFs of and are always bimodal. The ion energy peak separation width largely depends on the ion masses. The IADFs are affected by the bias voltage, pressures and coil powers. The results at different coil powers indicate the importance of considering the collisions induced by atoms, especially in a a molecular gas.

Sponsoring Organization:
USDOE
OSTI ID:
1399615
Journal Information:
Plasma Processes and Polymers, Journal Name: Plasma Processes and Polymers Journal Issue: 4-5 Vol. 14; ISSN 1612-8850
Publisher:
Wiley Blackwell (John Wiley & Sons)Copyright Statement
Country of Publication:
Germany
Language:
English

References (32)

Principles of Plasma Discharges and Materials Processing book January 2005
A Monte Carlo collision model for the particle-in-cell method: applications to argon and oxygen discharges journal May 1995
Recombination coefficients of O and N radicals on stainless steel journal September 2000
Atomic oxygen surface loss coefficient measurements in a capacitive/inductive radio-frequency plasma journal July 2002
Charged species dynamics in an inductively coupled Ar/SF6 plasma discharge journal December 2002
Anomalies of the Energy of Positive Ions Extracted from High‐Frequency Ion Sources. A Theoretical Study journal November 1968
Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics journal July 2005
Particle-in-cell Monte Carlo and fluid simulations of argon-oxygen plasma: Comparisons with experiments and validations journal May 2006
Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors journal March 1996
Measurements of negative ion density in high-density oxygen plasmas by probe-assisted laser photodetachment journal January 1998
Surface chemistry of metastable oxygen. II. Destruction of O 2 ( a   1 Δ g ) journal December 1989
Phase modulation in pulsed dual-frequency capacitively coupled plasmas journal June 2014
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design journal September 2009
Dynamic investigation of mode transition in inductively coupled plasma with a hybrid model journal October 2009
Investigation of the effect of metastable atoms on mode transition in argon inductive discharge via a hybrid model journal June 2010
Electron release in the afterglow of a pulsed inductively-coupled radiofrequency oxygen plasma journal February 2006
Oxygen discharges diluted with argon: dissociation processes journal April 2007
Energy deposition via magnetoplasmadynamic acceleration: II. modeling and performance predictions journal November 2008
A global (volume averaged) model of a nitrogen discharge: I. Steady state journal July 2009
A global (volume averaged) model of a chlorine discharge journal October 2009
The low pressure Cl 2 /O 2 discharge and the role of ClO journal September 2010
Fast 2D hybrid fluid-analytical simulation of inductive/capacitive discharges journal April 2011
A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code journal May 2013
Fast 2D fluid-analytical simulation of ion energy distributions and electromagnetic effects in multi-frequency capacitive discharges journal December 2014
Characterization of O 2 /Ar inductively coupled plasma studied by using a Langmuir probe and global model journal April 2015
A computational analysis of the vibrational levels of molecular oxygen in low-pressure stationary and transient radio-frequency oxygen plasma journal March 2016
A hybrid model of radio frequency biased inductively coupled plasma discharges: description of model and experimental validation in argon journal June 2016
A two-region model of a radiofrequency low-pressure, high-density plasma journal August 1995
Spatiotemporal characteristics of the collisionless rf sheath and the ion energy distributions arriving at rf-biased electrodes journal February 2002
Multiple ion dynamics model for the collisionless rf sheaths and the ion energy distributions at rf-biased electrodes in fluorocarbon plasmas journal August 2002
Improved volume-averaged model for steady and pulsed-power electronegative discharges
  • Kim, Sungjin; Lieberman, M. A.; Lichtenberg, A. J.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, Issue 6 https://doi.org/10.1116/1.2345645
journal November 2006
Global model of Ar, O 2 , Cl 2 , and Ar/O 2 high‐density plasma discharges journal March 1995

Similar Records

Related Subjects