On the tungsten single crystal coatings achieved by chemical vapor transportation deposition

Shi, J. Q.; Shen, Y. B.; Yao, S. Y.; Zhang, P. J.; Zhou, Q.; Guo, Y. Z.; Tan, C. W.; Yu, X. D.; Nie, Z. H.; Ma, H. L.; Cai, H. N.

doi:10.1016/j.matchar.2016.10.016

Title: On the tungsten single crystal coatings achieved by chemical vapor transportation deposition

Full Record
Other Related Research

Authors:: Shi, J. Q.; Shen, Y. B.; Yao, S. Y.; Zhang, P. J.; Zhou, Q.; Guo, Y. Z.; Tan, C. W.; Yu, X. D.; Nie, Z. H.; Ma, H. L.; Cai, H. N.

Publication Date:: Thu Dec 01 00:00:00 EST 2016

Sponsoring Org.:: USDOE

OSTI Identifier:: 1399152

Grant/Contract Number:: AC02-06CH11357

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Materials Characterization

Additional Journal Information:: Journal Name: Materials Characterization Journal Volume: 122 Journal Issue: C; Journal ID: ISSN 1044-5803

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

Citation Formats


                    Shi, J. Q., Shen, Y. B., Yao, S. Y., Zhang, P. J., Zhou, Q., Guo, Y. Z., Tan, C. W., Yu, X. D., Nie, Z. H., Ma, H. L., and Cai, H. N. On the tungsten single crystal coatings achieved by chemical vapor transportation deposition.  United States: N. p., 2016. 
Web.  doi:10.1016/j.matchar.2016.10.016.

Copy to clipboard


                    Shi, J. Q., Shen, Y. B., Yao, S. Y., Zhang, P. J., Zhou, Q., Guo, Y. Z., Tan, C. W., Yu, X. D., Nie, Z. H., Ma, H. L., & Cai, H. N. On the tungsten single crystal coatings achieved by chemical vapor transportation deposition.  United States.  https://doi.org/10.1016/j.matchar.2016.10.016

Copy to clipboard


                    Shi, J. Q., Shen, Y. B., Yao, S. Y., Zhang, P. J., Zhou, Q., Guo, Y. Z., Tan, C. W., Yu, X. D., Nie, Z. H., Ma, H. L., and Cai, H. N. Thu .  
"On the tungsten single crystal coatings achieved by chemical vapor transportation deposition".  United States.  https://doi.org/10.1016/j.matchar.2016.10.016.

Copy to clipboard


                    
@article{osti_1399152,

  title        = {On the tungsten single crystal coatings achieved by chemical vapor transportation deposition},

  author       = {Shi, J. Q. and Shen, Y. B. and Yao, S. Y. and Zhang, P. J. and Zhou, Q. and Guo, Y. Z. and Tan, C. W. and Yu, X. D. and Nie, Z. H. and Ma, H. L. and Cai, H. N.},

  abstractNote = {},

  doi          = {10.1016/j.matchar.2016.10.016},

  journal      = {Materials Characterization},

  number       = C,

  volume       = 122,

  place        = {United States},

  year         = {Thu Dec 01 00:00:00 EST 2016},

  month        = {Thu Dec 01 00:00:00 EST 2016}

}

Copy to clipboard

Journal Article:

Free Publicly Available Full Text

Accepted Manuscript (Publisher)

Publisher's Version of Record
https://doi.org/10.1016/j.matchar.2016.10.016

Other availability

Search WorldCat to find libraries that may hold this journal

Citation Metrics:

Cited by: 12 works

Citation information provided by
Web of Science

Save / Share:

Export Metadata

Save to My Library

Similar Records in DOE PAGES and OSTI.GOV collections:

On the tungsten single crystal coatings achieved by chemical vapor transportation deposition

Journal Article Shi, J. Q. ; Shen, Y. B. ; Yao, S. Y. ; ... - Materials Characterization

The tungsten single crystal has many excellent properties, namely a high melting point, high anti-creeping strength. Chemical vapor transportation deposition (CVTD) is a possible approach to achieve large-sized W single crystals for high-temperature application such as the cathode of a thermionic energy converter. In this work, CVTD W coatings were deposited on the monocrystalline molybdenum substrate (a tube with < 111 > axial crystalline orientation) using WCl{sub 6} as a transport medium. The microstructures of the coatings were investigated by a scanning electron microscope (SEM) and electron backscatter diffraction (EBSD). The as-deposited coatings are hexagonal prisms—rough surfaces perpendicular to <more »« less
https://doi.org/10.1016/J.MATCHAR.2016.10.016
Conditions for tunnel formation in LPCVD (low pressure chemical vapor deposition) tungsten films on single crystal silicon

Conference Blewer, R S ; Headley, T J ; Tracy, M E

The occurrence of microscopic filamentary voids (''tunnels'' or ''worm holes'') in silicon beneath chemically vapor deposited tungsten films has been investigated over a wide range of wafer and deposition conditions. The effect of dopant type, concentration, and infusion method, dry and wet etch pretreatment, deposition temperature, reaction sequence, deposition time and phase of the tungsten film have all been studied. Three deposition techniques (two selective and one non-selective) have been identified which avoid tunnel formation for the wafer conditions considered in this investigation, thus providing an operational regime in which tunnel formation is not an issue. 14 refs., 10 figs.,more » 1 tab.« less
Microstructures of chemical vapor deposited high-purity tungsten achieved by two different precursors

Journal Article Shi, J. Q. ; Yao, S. Y. ; Wang, F. ; ... - Materials Characterization

Highlights: • CVD tungsten used as electron emitters of thermionic fuel elements was investigated. • Microstructures were characterized with metallography analysis. • The preferred orientation was determined with XRD and EBSD. • The surface morphology was observed with SEM and WLI. • Tungsten via thermolysis of WCl{sub 6} is better for thermionic fuel elements. - Abstract: Chemical vapor deposited (CVD) high-purity tungsten can be manufactured as electron emitters in thermionic fuel elements. Exposed surface planes of the emitter emit electrons and affect the efficiency and load capacity of the thermionic fuel element. In order to determine the electron emission planesmore »« less
https://doi.org/10.1016/J.MATCHAR.2017.10.007
Low-temperature chemical vapor deposition tungsten carbide coatings for wear/erosion resistance

Journal Article Garg, D ; Dyer, P N ; Dimos, D B ; ... - Journal of the American Ceramic Society; (United States)

This paper reports on a new chemical vapor deposition (CVD) process that has been developed to deposit hard coatings, containing tungsten carbide, at temperatures below 500{degrees} C. These coatings, which have been applied to both ferrous and nonferrous alloys, exhibit excellent resistance to wear and erosion. The coatings comprise a mixture of tungsten and the tungsten carbide, the latter being present as W{sub 2}C, W{sub 2}C + W{sub 3}C or W{sub 3}C. The coatings' composition and properties can be controlled by varying the CVD process parameters. The unique lamellar, fine-grained microstructures of these coatings contribute to their good tribological properties.
https://doi.org/10.1111/j.1151-2916.1992.tb04176.x
Chemically vapor deposited tungsten coatings for erosion protection

Technical Report Haskell, R W ; Imam, A R

Erosion resistant, chemically vapor deposited tungsten coatings can be applied to steel at temperatures below the tempering temperature. A nickel inner layer is used to promote adherence. These coatings increase the erosion life of steel by at least a factor of ten; however, because of the high thermal conductivity of tungsten they increase the heat absorption. Their resistance to thermal fatigue can be improved by refining the columnar grain structure. The tungsten coatings may be significantly improved by an addition of silicon introduced as silane in the reactant gas mixture. The resultant silicon-alloyed tungsten coating is fine grained, has amore »« less

Similar Records