Experimental verification of the model for formation of double Shockley stacking faults in highly doped regions of PVT-grown 4H–SiC wafers
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1396704
- Grant/Contract Number:
- AC02-06CH11357; AC02-05CH11231; AC02-98CH10886
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Crystal Growth
- Additional Journal Information:
- Journal Name: Journal of Crystal Growth Journal Volume: 452 Journal Issue: C; Journal ID: ISSN 0022-0248
- Publisher:
- Elsevier
- Country of Publication:
- Netherlands
- Language:
- English
Citation Formats
Yang, Yu, Guo, Jianqiu, Goue, Ouloide, Raghothamachar, Balaji, Dudley, Michael, Chung, Gil, Sanchez, Edward, Quast, Jeff, Manning, Ian, and Hansen, Darren. Experimental verification of the model for formation of double Shockley stacking faults in highly doped regions of PVT-grown 4H–SiC wafers. Netherlands: N. p., 2016.
Web. doi:10.1016/j.jcrysgro.2016.01.013.
Yang, Yu, Guo, Jianqiu, Goue, Ouloide, Raghothamachar, Balaji, Dudley, Michael, Chung, Gil, Sanchez, Edward, Quast, Jeff, Manning, Ian, & Hansen, Darren. Experimental verification of the model for formation of double Shockley stacking faults in highly doped regions of PVT-grown 4H–SiC wafers. Netherlands. https://doi.org/10.1016/j.jcrysgro.2016.01.013
Yang, Yu, Guo, Jianqiu, Goue, Ouloide, Raghothamachar, Balaji, Dudley, Michael, Chung, Gil, Sanchez, Edward, Quast, Jeff, Manning, Ian, and Hansen, Darren. Sat .
"Experimental verification of the model for formation of double Shockley stacking faults in highly doped regions of PVT-grown 4H–SiC wafers". Netherlands. https://doi.org/10.1016/j.jcrysgro.2016.01.013.
@article{osti_1396704,
title = {Experimental verification of the model for formation of double Shockley stacking faults in highly doped regions of PVT-grown 4H–SiC wafers},
author = {Yang, Yu and Guo, Jianqiu and Goue, Ouloide and Raghothamachar, Balaji and Dudley, Michael and Chung, Gil and Sanchez, Edward and Quast, Jeff and Manning, Ian and Hansen, Darren},
abstractNote = {},
doi = {10.1016/j.jcrysgro.2016.01.013},
journal = {Journal of Crystal Growth},
number = C,
volume = 452,
place = {Netherlands},
year = {Sat Oct 01 00:00:00 EDT 2016},
month = {Sat Oct 01 00:00:00 EDT 2016}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.jcrysgro.2016.01.013
https://doi.org/10.1016/j.jcrysgro.2016.01.013
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Cited by: 5 works
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Works referenced in this record:
Technological Breakthroughs in Growth Control of Silicon Carbide for High Power Electronic Devices
journal, October 2004
- Matsunami, Hiroyuki
- Japanese Journal of Applied Physics, Vol. 43, Issue 10