Aperiodic Mo/Si multilayers for hard x-rays
Abstract
In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ± 0.05°. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard x-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of ± 0.05°, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard x-ray imaging of highly diverging sources.
- Authors:
-
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Rigaku Innovative Technologies, Inc., Auburn Hills, MI (United States)
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1393341
- Report Number(s):
- LLNL-JRNL-691813
Journal ID: ISSN 1094-4087; OPEXFF
- Grant/Contract Number:
- AC52-07NA27344
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Optics Express
- Additional Journal Information:
- Journal Volume: 24; Journal Issue: 16; Journal ID: ISSN 1094-4087
- Publisher:
- Optical Society of America (OSA)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 42 ENGINEERING
Citation Formats
Pardini, Tom, Alameda, Jennifer, Platonov, Yuriy, Robinson, Jeff, Soufli, Regina, Spiller, Eberhard, Walton, Chris, and Hau-Riege, Stefan P. Aperiodic Mo/Si multilayers for hard x-rays. United States: N. p., 2016.
Web. doi:10.1364/OE.24.018642.
Pardini, Tom, Alameda, Jennifer, Platonov, Yuriy, Robinson, Jeff, Soufli, Regina, Spiller, Eberhard, Walton, Chris, & Hau-Riege, Stefan P. Aperiodic Mo/Si multilayers for hard x-rays. United States. https://doi.org/10.1364/OE.24.018642
Pardini, Tom, Alameda, Jennifer, Platonov, Yuriy, Robinson, Jeff, Soufli, Regina, Spiller, Eberhard, Walton, Chris, and Hau-Riege, Stefan P. Thu .
"Aperiodic Mo/Si multilayers for hard x-rays". United States. https://doi.org/10.1364/OE.24.018642. https://www.osti.gov/servlets/purl/1393341.
@article{osti_1393341,
title = {Aperiodic Mo/Si multilayers for hard x-rays},
author = {Pardini, Tom and Alameda, Jennifer and Platonov, Yuriy and Robinson, Jeff and Soufli, Regina and Spiller, Eberhard and Walton, Chris and Hau-Riege, Stefan P.},
abstractNote = {In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ± 0.05°. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard x-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of ± 0.05°, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard x-ray imaging of highly diverging sources.},
doi = {10.1364/OE.24.018642},
journal = {Optics Express},
number = 16,
volume = 24,
place = {United States},
year = {Thu Aug 04 00:00:00 EDT 2016},
month = {Thu Aug 04 00:00:00 EDT 2016}
}
Web of Science
Works referenced in this record:
Design, deposition, and characterization of multilayer coatings for the Ultraviolet and Visible-Light Coronagraphic imager
journal, January 2004
- Pelizzo, Maria-Guglielmina; Gardiol, Daniele; Nicolosi, Piergiorgio
- Applied Optics, Vol. 43, Issue 13
Demonstration of multilayer reflective optics at photon energies above 06 MeV
journal, January 2014
- Brejnholt, Nicolai F.; Soufli, Regina; Descalle, Marie-Anne
- Optics Express, Vol. 22, Issue 13
Optical and multilayer design for the first Kirkpatrick-Baez optics for x-ray diagnostic at NIF
conference, September 2013
- Pardini, Tom; McCarville, Tom J.; Walton, Christopher C.
- SPIE Optical Engineering + Applications, SPIE Proceedings
A Kirkpatrick-Baez microscope for the National Ignition Facility
journal, November 2014
- Pickworth, L. A.; McCarville, T.; Decker, T.
- Review of Scientific Instruments, Vol. 85, Issue 11
Framed, 16-image, Kirkpatrick–Baez microscope for laser–plasma x-ray emission
journal, October 2004
- Marshall, F. J.; Oertel, J. A.; Walsh, P. J.
- Review of Scientific Instruments, Vol. 75, Issue 10
Wolter-like high resolution x-ray imaging microscope for Rayleigh Taylor instabilities studies
journal, June 2005
- Troussel, Ph.; Meyer, B.; Reverdin, R.
- Review of Scientific Instruments, Vol. 76, Issue 6
Multilayer optics for monochromatic high-resolution X-ray imaging diagnostic in a broad photon energy range from 2 keV to 22 keV
journal, December 2014
- Troussel, Ph.; Dennetiere, D.; Maroni, R.
- Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 767
Thermally induced structural modification of Mo‐Si multilayers
journal, March 1990
- Stearns, D. G.; Stearns, M. B.; Cheng, Y.
- Journal of Applied Physics, Vol. 67, Issue 5
On the formation of molybdenum silicides in MoSi multilayers: the effect of Mo thickness and annealing temperature
journal, February 1992
- Ijdiyaou, Y.; Azizan, M.; Ameziane, E. L.
- Applied Surface Science, Vol. 55, Issue 2-3
Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
journal, July 1999
- Mirkarimi, Paul B.
- Optical Engineering, Vol. 38, Issue 7
Mo/Si-multilayers for EUV applications prepared by Pulsed Laser Deposition (PLD)
journal, September 2001
- Braun, St; Dietsch, R.; Haidl, M.
- Microelectronic Engineering, Vol. 57-58
Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers
journal, July 2001
- Bajt, Saša; Stearns, Daniel G.; Kearney, Patrick A.
- Journal of Applied Physics, Vol. 90, Issue 2
Developments in realistic design for aperiodic Mo/Si multilayer mirrors
journal, January 2006
- Aquila, A. L.; Salmassi, F.; Dollar, F.
- Optics Express, Vol. 14, Issue 21
Thermally enhanced interdiffusion in Mo∕Si multilayers
journal, April 2008
- Nedelcu, I.; van de Kruijs, R. W. E.; Yakshin, A. E.
- Journal of Applied Physics, Vol. 103, Issue 8
Demonstration of the high collection efficiency of a broadband Mo/Si multilayer mirror with a graded multilayer coating on an ellipsoidal substrate
journal, September 2015
- Ichimaru, S.; Takenaka, H.; Namikawa, K.
- Review of Scientific Instruments, Vol. 86, Issue 9
IMD—Software for modeling the optical properties of multilayer films
journal, January 1998
- Windt, David L.
- Computers in Physics, Vol. 12, Issue 4