InAlAs photovoltaic cell design for high device efficiency
- Rochester Institute of Technology, Rochester, NY (United States)
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
This study presents a new design for a single-junction InAlAs solar cell, which reduces parasitic absorption losses from the low band-gap contact layer while maintaining a functional window layer by integrating a selective etch stop. The etch stop is then removed prior to depositing an anti-reflective coating. The final cell had a 17.9% efficiency under 1-sun AM1.5 with an anti-reflective coating. Minority carrier diffusion lengths were extracted from external quantum efficiency data using physics-based device simulation software yielding 170 nm in the n-type emitter and 4.6 um in the p-type base, which is more than four times the diffusion length previously reported for a p-type InAlAs base. In conclusion, this report represents significant progress towards a high-performance InAlAs top cell for a triple-junction design lattice-matched to InP.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- Grant/Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1374129
- Report Number(s):
- NREL/JA--5K00-69002
- Journal Information:
- Progress in Photovoltaics, Journal Name: Progress in Photovoltaics Journal Issue: 8 Vol. 25; ISSN 1062-7995
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
| Contactless electroreflectance study of the surface potential barrier in n -type and p -type InAlAs van Hoof structures lattice matched to InP 
 | journal | May 2018 | 
| Electron transport in the solar-relevant InAlAs 
 | journal | May 2019 | 
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